Vacuum arc plasma and ion source technologies underpin a range of advanced applications, from surface coating and materials synthesis to particle acceleration and fusion research. In these systems, a ...

Layerava from Okyay Tech is an adaptable research device designed for university and industrial research laboratories that use Hollow Cathode Plasma Enhanced Atomic Layer Deposition (HCP-ALD).

Common plasma sources, such as CCP and ICP, were created decades ago for use in the semiconductor industry. At that time, plasma sources were primarily used to deposit silicon oxide and silicon ...