Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Design patterns have a wide variety of applications in the design, verification and test flows of IC development. From significantly reducing rule deck complexity to simplifying the task of avoiding ...

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

HOUSTON – (Sept. 27, 2023) Rice University computer scientists have won two grants from the National Science Foundation to explore new information processing technologies and applications that combine ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

Introduced with the Java 17 release, pattern matching enhances the instanceof operator so Java developers can better check and object's type and extract its components, and more efficiently deal with ...